Ultra-high Resolution Electron-beam Lithography System
ETH Zürich is buying one automated electron-beam lithography system for BRNC research, from nanometre-scale structures to rapid exposure of complex large-area patterns.
- Deliverables
- Supply, install, train users on and obtain acceptance for one system; support wafers up to 200 mm.
- Contract
- Price includes transport, installation, training and 2 years warranty; lifecycle costs assessed over 15 years in CHF.
- Eligibility
- Prove 2 comparable installations in the last 4 years, submit 3 years’ turnover, and identify a test system and location.
- Award
- Technical value scores 1000 points; lifecycle costs score 400, within a 1750-point total.
- Watch out
- Prices must fall with market reductions before final acceptance; advances over CHF 50'000 require equal-value security.
Documents for your bid
- Annex 1_Conditions_of_participation.zipTender documents · 570 KB
- Annex 2_Requirements_Price Sheet_Goods.xlsxTender documents · 29 KB
- Specification_E-beam_lithography_BRNC.pdfTender documents · 519 KB
Key dates
- 01.10.2026Published on simap.ch
- 21.10.2026Questions round
- 10.11.2026, 23:58Submission deadlineDeadline in 14 days
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Notice text
View on simap.ch
Unofficial reproduction. The German text below is taken unchanged from SIMAP notice no. 45007. Only the official notice is binding.
The B & R Nanotechnology Center (BRNC) at ETH Zurich invites tenders for the purchase of one (1) ultra-high resolution electron-beam lithography (EBL) system. The system will be used for a variety of research activities of internal and external users, ranging from the generation of high-precision structures at the nanometer level to the rapid exposure of complex structures over large areas. The scope includes delivery, installation, training and acceptance of the system.